We are pleased to announce that Patrick N. Lundell has joined our firm
Patrick N. Lundell has joined Hoge Fenton as a member of our litigation practice group with a focus on intellectual property and complex commercial litigation matters. He has represented and assisted clients with claims concerning patent, trademark and copyright infringement and trade-secret misappropriation. He has also assisted clients with trademark registration and cancellation actions, and cybersquatting and domain name disputes.
Patrick also has prior industry experience in various technology sectors including optical networking components, semiconductor equipment and manufacturing, networking component test and development tools, global positioning and geographic information systems, and photovoltaic solar equipment manufacturing.
Prior to Hoge Fenton, Patrick worked for Haynes and Boone, LLP in San Jose, and Finisar Corporation in Sunnyvale.
We hope you have an opportunity soon to meet Patrick Lundell. Please feel free to contact Patrick or any member of our Litigation Group or Intellectual Property Practice Group directly.
For more information about our Intellectual Property Group, please click here.
For more information about our Litigation Group, please click here.